Abstract

Sunil Kumar^*, Hansraj Sharma, Jagdish Parsad, Jagavendra Yadav and Mangej Singh

DOI : http://dx.doi.org/10.13005/ojc/390419

By using the spin coating method, Ag ion implanted TiO2 layers were deposited. These thin films were made on a glass substrate that had been meticulously cleaned. The characterization of synthesized Ag-dopped TiO2 thin films by XRD, UV-Vis spectrometer, and SEM with EDX. The outcomes demonstrated the presence of crystalline anatase phase and smooth surface morphologies in the Ag-TiO2 films that were annealed at 5000C. SEM results are utilized to investigate the surface morphology and element identification that has been verified by EDX analysis. The band gap for undoped TiO2 and silver-dopped TiO2 thin films is suggested by the UV-Vis investigation and we get it 2.88eV, 2.96eV, and 3.16eV subsequently. In addition, the findings showed that compared to undoped TiO2 films, the Ag-doped TiO2 film demonstrated higher photocatalytic activity.

Annealing temperature; Titanium oxide; silver doped titanium dioxide; sol-gel procedure; X-ray diffraction

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