ISSN : 0970 - 020X, ONLINE ISSN : 2231-5039
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Abstract

Influence of complexing agent on the growth of chemically deposited Ni3Pb2S2 thin films

Ho Soonmin

DOI : http://dx.doi.org/10.13005/ojc/300311


Abstract:

Ni3Pb2S2 thin films were prepared by chemical bath deposition method. Here, the objective of this research was to investigate the influence of complexing agent on the properties of films.These films were characterized using atomic force microscopy, UV-Visible spectro photometer and X-ray diffraction. It was found that, as the concentration of tartaric acid increased, film thickness increased, but, the band gap reduced. For the films prepared using 0.1M of tartaric acid, the films were uniform and completely covered the substrates.

Keywords:

thin films; chemical bath deposition; thickness; band gap

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